Multi-beam Coherent Fourier Scatterometry

Abstract

Recent technological advancements in the past decades have been driven by the miniaturisation of devices using surfaces with nano-scale features. These advancements require fast, large area measurement techniques that can be used in process control to detect surface contaminations or to monitor fabrication quality. Here we present a modified version of the scanning coherent Fourier scatterometer with multiple beams that can be used to scan larger areas without increasing the scan time or decreasing the spatial resolution.