Fast and broadband spatial-photoresistance modulation in graphene–silicon heterojunctions

Abstract

Different types of devices with modulable resistance are attractive for the significant potential applications such as sensors, information storage, computation, etc. Although extensive research has been reported on resistance effects, there is still a need for exploring new mechanisms that offer advantages of low power consumption, high sensitivity, and long-term stability. Here, we report a graphene–Si based spatial-dependence photo-rheostat (SDPR), which enables bipolar resistance modulation in the range of 5 mm with a resistance sensitivity exceeding 1,000 Ω/mm at operating wavelengths from visible to near infrared band (1,550 nm). Especially, at ultra-low energy consumption, the device can achieve modulation of even 5 orders of magnitude of resistance and response speed up to 10 kHz. A theoretical model based on carrier dynamics is established to reveal the diffusion and drift of carriers as a mechanism explaining such experimental phenomenon. This work provides a new avenue to modulate resistance at low power consumption as novel opto-potentiometers in various photoelectric applications.

Keywords

• graphene
• bipolar resistance effect
• position
• near infrared
• plasma