Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition

Camelia Albu; Sandra A.V. Eremia; Monica Lucia Veca; Andrei Avram; Radu Cristian Popa; Cristina Pachiu; Cosmin Romanitan; Mihaela Kusko; Raluca Gavrila; Antonio Radoi

Data in Brief (Jun 2019)

Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition

Camelia Albu,
Sandra A.V. Eremia,
Monica Lucia Veca,
Andrei Avram,
Radu Cristian Popa,
Cristina Pachiu,
Cosmin Romanitan,
Mihaela Kusko,
Raluca Gavrila,
Antonio Radoi

Affiliations

Camelia Albu: Centre of Bioanalysis, National Institute of Research and Development for Biological Sciences – Bucharest, 296 Splaiul Independentei, Bucharest, 060031, Romania
Sandra A.V. Eremia: Centre of Bioanalysis, National Institute of Research and Development for Biological Sciences – Bucharest, 296 Splaiul Independentei, Bucharest, 060031, Romania; Corresponding author.
Monica Lucia Veca: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Andrei Avram: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Radu Cristian Popa: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Cristina Pachiu: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Cosmin Romanitan: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Mihaela Kusko: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Raluca Gavrila: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania
Antonio Radoi: National Institute for Research and Development in Microtechnology – IMT Bucharest, 126A Erou Iancu Nicolae Street, 077190, Voluntari, Romania; Corresponding author.

Journal volume & issue: Vol. 24

Abstract

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A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO2) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (SEM) micrographs, Raman spectrum and X-ray diffraction (XRD) pattern are herein illustrated. The as deposited NCG film was electrochemically pretreated (3 mA applied current, during 240 s, in 10 mM phosphate buffer saline (PBS) solution containing 0.1 M KCl, pH 7) and thereafter used as electrode for sensing the caffeic acid content in lyophilised berries and dried chokeberries in “Nano-crystalline graphite film on SiO2: Electrochemistry and electro-analytical application” [1]. Keywords: Plasma-enhanced chemical vapour deposition (PECVD), Nano-crystalline graphite (NCG), Electrochemistry, Caffeic acid

Published in Data in Brief

ISSN: 2352-3409 (Online)
Publisher: Elsevier
Country of publisher: United States
LCC subjects: Medicine: Medicine (General): Computer applications to medicine. Medical informatics; Science: Science (General)
Website: http://www.journals.elsevier.com/data-in-brief/

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