Deposition of Tio2/Pt Composite Particles Using Pulsed Laser Deposition Technique

Abstract

In the present work, the titanium oxide platinum (TiO2/Pt) composite particles were deposited on the Si and glass substrates at (400)°C using pulsed laser deposition technique to ablation of TiO2 target at constant laser energy 800 mJ, a double frequency Q-switching Nd: YAG laser beam ( λ= 532 nm, repetition rate 6Hz and the pulsed duration 10ns). Ultraviolet visible (UV-Vis) spectroscopy, X-ray diffraction (XRD),X-ray fluorescence (XRF), Atomic force microscopy (AFM),Scanning Electron Microscopy (SEM), electrical conductivity (σdc), Hall coefficient (RH) ,(I-V) and (C-V) were used to characterize the morphology and electrical of the films. The results showed that the transparency of film reached to about (80%) with optical band gap (3.64) and (3.76) eV for Pure TiO2 and 5% Pt:TiO2 respectively. The structural and composition of the obtained films at level 5% of platinum doping into TiO2 have been determined. The results indicated that the prepared films (Pt doped TiO2) were nanostructure and uniform with diameters less than 20 nm.

Keywords

• Pulsed Laser Deposition Technique
• Pt doped TiO2