Jin'gangshi yu moliao moju gongcheng (Jun 2023)

Simulation analysis of uniformity of optical sphere polishing motion trajectory

  • Weiming WANG,
  • Zhen LI,
  • Qingzhong LI

DOI
https://doi.org/10.13394/j.cnki.jgszz.2022.0120
Journal volume & issue
Vol. 43, no. 3
pp. 386 – 391

Abstract

Read online

In order to improve the processing quality, processing efficiency and reduce the cost wastage of the dome surface, the effect of each motion parameter on the uniformity of material removal from the optical dome surface during the polishing process was investigated. In this paper, the dispersion coefficient was used as the evaluation index, and the single abrasive particle motion trajectory model was established based on the relative motion and vector method. A triangular mesh was used to iteratively divide the surface of the orthorhombic icosahedron, and the number of trajectory points in each triangular mesh was counted to characterize the number of polishing times. It can be concluded that the speed ratio has a significant effect on the distribution of abrasive trajectories and material removal. With the same speed ratio, increasing the radius of the polishing head, the dispersion coefficient gradually decreases and the uniformity of dome surface material removal changes from poor to good. Increasing the pendulum speed, the length and density of the trajectory gradually decrease, the dispersion coefficient becomes larger, and the non-uniformity of the dome surface increases. The change in the initial phase of abrasive particles has essentially no effect on trajectory uniformity.

Keywords