AIP Advances (Sep 2018)

Pulsed laser deposition of oxide thin films by the fifth harmonic of a Nd:Y3Al5O12 (Nd:YAG) laser

  • Ryota Shimizu,
  • Issei Sugiyama,
  • Naoto Nakamura,
  • Shigeru Kobayashi,
  • Taro Hitosugi

DOI
https://doi.org/10.1063/1.5048441
Journal volume & issue
Vol. 8, no. 9
pp. 095101 – 095101-6

Abstract

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We report the pulsed laser deposition (PLD) of anatase TiO2, LaAlO3, and La0.7Ca0.3MnO3 epitaxial thin films by a fifth-harmonic Nd:Y3Al5O12 (Nd:YAG) laser. High-quality anatase Ti0.996Nb0.004O2 epitaxial thin films were deposited and showed transparent conducting properties, with a maximum mobility of 94 cm2V−1s−1 at 80 K. These results are consistent with those obtained for films deposited by excimer lasers. Furthermore, we report the deposition of droplet-free flat LaAlO3 and La0.7Ca0.3MnO3 films. The latter films exhibited an insulator-to-metal transition at ∼240 K, accompanied by a large magnetoresistive effect, in agreement with previous studies using excimer lasers. These results indicate that the fifth harmonic of a Nd:YAG laser may be a potential alternative to excimer lasers for PLD.