Journal of Nanostructures (Sep 2012)

Influence of nanostructured TiO2 film thickness on photoelectrode structure and performance of flexible Dye- Sensitized Solar Cells

  • M. Malekshahi Byranvand,
  • A. Nemati Kharat,
  • L. Fatholahi

DOI
https://doi.org/10.7508/jns.2012.03.009
Journal volume & issue
Vol. 2, no. 3
pp. 327 – 332

Abstract

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A commercial Ti-Nanoxide was deposited on In-doped SnO2 (ITO) polymer substrates by tape casting technique with different thicknesses (7, 14 and 36μm) to be used as photoelectrode in flexible dye-sensitized solar cells (DSSCs). Ruthenium dye was adsorbed on each TiO2 film for 24 h. The resulting photoelectrodes were used to form flexible DSSCs in combination with electrolyte and counter electrode. The prepared films were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Photovoltaic parameters like short circuit current (Isc), open circuit voltage (Voc), fill factor (FF) and power conversion efficiency (η) were evaluated for fabricated cells. The cell formed with a TiO2 film of 14μm thickness reached the best performance. 2012 JNS All rights reserved

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