Effect of Substrate-Thickness on Voltage Responsivity of MEMS-Based ZnO Pyroelectric Infrared Sensors

Abstract

Pyroelectric infrared sensors incorporating suspended zinc oxide (ZnO) pyroelectric films and thermally insulated silicon substrates are fabricated using conventional MEMS-based thin-film deposition, photolithography, and etching techniques. The responsivity of the pyroelectric films is improved through annealing at a temperature of 500 °C for 4 h. The temperature variation and voltage responsivity of the fabricated sensors are evaluated numerically and experimentally for substrate thickness in the range of 1 to 500 μm. The results show that the temperature variation and voltage responsivity both increase with a reducing substrate thickness. For the lowest film thickness of 1 μm, the sensor achieves a voltage sensitivity of 3880 mV/mW at a cutoff frequency of 400 Hz. In general, the results presented in this study provide a useful source of reference for the further development of MEMS-based pyroelectric infrared sensors.

Keywords

• etching
• MEMS
• pyroelectric infrared sensor
• substrate thickness