Nanomaterials (Sep 2024)

Characterization of Trap States in AlGaN/GaN MIS-High-Electron-Mobility Transistors under Semi-on-State Stress

  • Ye Liang,
  • Jiachen Duan,
  • Ping Zhang,
  • Kain Lu Low,
  • Jie Zhang,
  • Wen Liu

DOI
https://doi.org/10.3390/nano14181529
Journal volume & issue
Vol. 14, no. 18
p. 1529

Abstract

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Devices under semi-on-state stress often suffer from more severe current collapse than when they are in the off-state, which causes an increase in dynamic on-resistance. Therefore, characterization of the trap states is necessary. In this study, temperature-dependent transient recovery current analysis determined a trap energy level of 0.08 eV under semi-on-state stress, implying that interface traps are responsible for current collapse. Multi-frequency capacitance–voltage (C-V) testing was performed on the MIS diode, calculating that interface trap density is in the range of 1.37×1013 to 6.07×1012cm−2eV−1 from EC−ET=0.29 eV to 0.45 eV.

Keywords