Generation of arbitrarily patterned polarizers using 2-photon polymerization

Abstract

Abstract Patterned polarizers are prepared using liquid crystals (LC) doped with a black dichroic dye and in combination with a linear polarizer. The pattern is achieved with a nanostructured LC alignment surface, that is generated using a two-photon polymerization direct laser write (2PP-DLW). This technique creates a pattern of high-resolution grooves in the photoresist at any arbitrary angle. The angle governs the LC orientation at any substrate surface point, determining the transmitted light linear polarization angle. This paper presents the first use of a 2PP-DLW cured positive tone photoresist for dichroic dye-doped LC alignment. Two complementary photoresists have been employed: conventional negative tone SU-8 photoresist and, in this context novel, positive tone S1805 photoresist. The alignment quality of the polarizers has been assessed by analyzing the transmission using an additional polarizer. For SU-8, the resulting grayscale pattern and a contrast ratio (CR) of 14 has measured. The uniformity of the alignment has been measured to be 65% using normalized Shannon entropy (H). For S1805, a CR of 37 was measured, and a uniformity of 63% was obtained. 2PP-DLW allows for shaping complex patterns in submicron dimensions and for the fabrication of arbitrarily patterned polarizers and other LC devices.