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ACS Omega
(Aug 2023)
Role of Oxygen in Amorphous Carbon Hard Mask Plasma Etching
Hee-Jung Yeom,
Min Young Yoon,
Daehan Choi,
Youngseok Lee,
Jung-Hyung Kim,
Shin-Jae You,
Hyo-Chang Lee
Affiliations
Hee-Jung Yeom
Korea Research Institute of Standards and Science, Daejeon, Republic of Korea
Min Young Yoon
Korea Research Institute of Standards and Science, Daejeon, Republic of Korea
Daehan Choi
Korea Research Institute of Standards and Science, Daejeon, Republic of Korea
Youngseok Lee
Institute of Quantum System (IQS), Chungnam National University, Daejeon, Republic of Korea
Jung-Hyung Kim
Korea Research Institute of Standards and Science, Daejeon, Republic of Korea
Shin-Jae You
Department of Physics, Chungnam National University, Daejeon, Republic of Korea
Hyo-Chang Lee
School of Electronics and Information Engineering, Korea Aerospace University, Goyang, Republic of Korea
DOI
https://doi.org/10.1021/acsomega.3c02438
Journal volume & issue
Vol. 8, no. 36
pp. 32450 – 32457
Abstract
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