Investigation of a metrological atomic force microscope system with a combined cantilever position, bending and torsion detection system

Abstract

This article presents a new metrological atomic force microscope (MAFM) head with a new beam alignment and a combined one-beam detection of the cantilever deflection. An interferometric measurement system is used for the determination of the position of the cantilever, while a quadrant photodiode measures the bending and torsion of the cantilever. To improve the signal quality and reduce disturbing interferences, the optical design was revised in comparison to the systems of others (Dorozhovets et al., 2006; Balzer et al., 2011; Hausotte et al., 2012). The integration of the MAFM head in a nanomeasuring machine (NMM-1) offers the possibility of large-scale measurements over a range of 25mm×25mm×5 mm with sub-nanometre resolution. A large number of measurements have been performed by this MAFM head in combination with the NMM-1. This paper presents examples of the measurements for the determination of step height and pitch and areal measurement.