Journal of the European Optical Society-Rapid Publications (Jan 2007)
Third order Bragg grating filters in small SOI waveguides
Abstract
Third order grating filters fabricated in small Silicon-on-Insulator rib waveguides are demonstrated. Variations in grating etch depth and duty cycle are considered, and a maximum experimental reflection of 42% is demonstrated for gratings of 1500 µm in length, with a grating period of approximately 689 nm and an etch depth of 200 nm. Agreement with modeling is shown to be good.
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