AIP Advances (May 2019)

Origin of planar Hall effect in type-II Weyl semimetal MoTe2

  • D. D. Liang,
  • Y. J. Wang,
  • W. L. Zhen,
  • J. Yang,
  • S. R. Weng,
  • X. Yan,
  • Y. Y. Han,
  • W. Tong,
  • W. K. Zhu,
  • L. Pi,
  • C. J. Zhang

DOI
https://doi.org/10.1063/1.5094231
Journal volume & issue
Vol. 9, no. 5
pp. 055015 – 055015-6

Abstract

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Besides the negative longitudinal magnetoresistance (MR), planar Hall effect (PHE) is a newly emerging experimental tool to test the chiral anomaly or nontrivial Berry curvature in Weyl semimetals (WSMs). However, the origins of PHE in various systems are not fully distinguished and understood. Here we perform a systematic study on the PHE and anisotropic MR (AMR) of Td-MoTe2, a type-II WSM. Although the PHE and AMR curves can be well fitted by the theoretical formulas, we demonstrate that the anisotropic resistivity arises from the orbital MR (OMR), instead of the negative MR as expected in the chiral anomaly effect. In contrast, the positive MR indicates that the large OMR dominates over the chiral anomaly effect. This explains why it is difficult to measure negative MR in type-II WSMs. We argue that the measured PHE can be related with the chiral anomaly only when the negative MR is simultaneously observed.