Surface Morphology of Cus Thin Films Observed by Atomic Force Microscopy

Abstract

CuS thin films were deposited onto microscope glass substrates using the chemical bath deposition method in the presence of tartaric acid as a complexing agent. The objective of this paper was to study the influence of the deposition time on the morphology of thin films. The surface morphology of the thin films was investigated using atomic force microscopy. The thin films deposited for the shortest time were found to be uniform, without cracks and with a dense surface morphology covering the entire substrate surface area. However, the films prepared for 60 min and above indicated incomplete coverage of the material over the substrate surface. The surface roughness and film thickness values that were observed depended mainly on the deposition time.

Keywords

• Surface roughness
• Film thickness
• Thin films
• Copper sulphide
• Chemical bath deposition method.