ECS Advances (Jan 2024)

Communication—Annealing Strategies for Spray Deposited Precursor Films of p-Type CuCr1-xMgxO2

  • M. Boshta,
  • M. M. Gomaa,
  • M. H. Sayed,
  • H. Mohamed,
  • A. Shengelaya,
  • E. Chikoidze,
  • Y. Dumont,
  • M. Neumann-Spallart

DOI
https://doi.org/10.1149/2754-2734/ad1a74
Journal volume & issue
Vol. 3, no. 1
p. 012001

Abstract

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Annealing of sprayed pure and Mg doped CuCrO _2 thin films by high intensity, short time light irradiation leads to a single delafossite phase at comparatively low temperatures compared with traditional furnace annealing. P-type crystalline undoped and Mg-doped CuCrO _2 films were obtained within few minutes by annealing with halogen lamp between 550 °C and 650 °C in Ar atmosphere. Transport properties of Mg-doped thin films were comparable to furnace annealed samples despite much shorter annealing time. The results demonstrate that post-annealing of chemically deposited samples using light irradiation is an effective and fast method for obtaining transparent conducting delafossite thin films.

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