Research progress on SiCN ceramic prepared at low temperature by chemical vapor deposition

Abstract

Chemical vapor deposition (CVD) is a new technology for preparing inorganic materials which possess some advantages, such as lower preparation temperature, uniform and compact microstructure, and near-size molding, so it is one of the common methods to prepare functional ceramics. In the paper, several common chemical vapor deposition methods like atmospheric chemical vapor deposition, low-pressure chemical vapor deposition, plasma-enhanced chemical vapor deposition and laser-assisted chemical vapor deposition are reviewed, because the microstructure and performance of functional ceramics are greatly influenced by their fabrication methods. In addition, the deposition parameters of Si-C-N absorbing ceramics which are deposited at lower temperature by low-pressure chemical vapor deposition are optimized. It is proposed that low-pressure chemical vapor deposition is the main method for preparing the advanced EMW absorbing ceramics.

Keywords

• CVD method
• SiCN ceramics
• microwave absorber
• absorbing properties