Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η5‑C5H4Se)2Zr(η5‑C5H5)2]2

• Clara Sanchez-Perez,
• Caroline E. Knapp,
• Ross H. Colman,
• Carlos Sotelo-Vazquez,
• Sanjayan Sathasivam,
• Raija Oilunkaniemi,
• Risto S. Laitinen,
• Claire J. Carmalt

Affiliations

Clara Sanchez-Perez

Materials Chemistry Centre, Department of Chemistry, University College London, London, U.K.

Caroline E. Knapp

Materials Chemistry Centre, Department of Chemistry, University College London, London, U.K.

Ross H. Colman

Faculty of Mathematics and Physics, Charles University, Prague 2, Czech Republic

Carlos Sotelo-Vazquez

Materials Chemistry Centre, Department of Chemistry, University College London, London, U.K.

Sanjayan Sathasivam

Materials Chemistry Centre, Department of Chemistry, University College London, London, U.K.

Raija Oilunkaniemi

Laboratory of Inorganic Chemistry, Environmental and Chemical Engineering, University of Oulu, Oulu, Finland

Risto S. Laitinen

Laboratory of Inorganic Chemistry, Environmental and Chemical Engineering, University of Oulu, Oulu, Finland

Claire J. Carmalt

Materials Chemistry Centre, Department of Chemistry, University College London, London, U.K.