Acoustic spectroscopy and electrical characterization of SiO2/Si structures with ultrathin SiO2 layers formed by nitric acid oxidation

• Bury Peter,
• Kobayashi Hikaru,
• Takahashi Masao,
• Imamura Kentaro,
• Sidor Peter,
• ÄŒernobila FrantiÅ¡ek

Affiliations

Bury Peter

Department of Physics, Faculty of Electrical Engineering, University of Žilina, Univerzitná 1, 010 26, Žilina, Slovakia

Kobayashi Hikaru

Institute of Scientific and Industrial Research, Osaka University, CREST, Japan Science and Technology Agency, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

Takahashi Masao

Institute of Scientific and Industrial Research, Osaka University, CREST, Japan Science and Technology Agency, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

Imamura Kentaro

Institute of Scientific and Industrial Research, Osaka University, CREST, Japan Science and Technology Agency, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan

Sidor Peter

Department of Physics, Faculty of Electrical Engineering, University of Žilina, Univerzitná 1, 010 26, Žilina, Slovakia

Černobila František

Department of Physics, Faculty of Electrical Engineering, University of Žilina, Univerzitná 1, 010 26, Žilina, Slovakia