Design and Fabrication of Silicon-Blazed Gratings for Near-Infrared Scanning Grating Micromirror

Abstract

Blazed gratings are the critical dispersion elements in spectral analysis instruments, whose performance depends on structural parameters and topography of the grating groove. In this paper, high diffraction efficiency silicon-blazed grating working at 800–2500 nm has been designed and fabricated. By diffraction theory analysis and simulation optimization based on the accurate boundary integral equation method, the blaze angle and grating constant are determined to be 8.8° and 4 μm, respectively. The diffraction efficiency is greater than 33.23% in the spectral range of 800–2500 nm and reach the maximum value of 85.62% at the blaze wavelength of 1180 nm. The effect of platform and fillet on diffraction efficiency is analyzed, and the formation rule and elimination method of the platform are studied. The blazed gratings are fabricated by anisotropic wet etching process using tilted (111) silicon substrate. The platform is minished by controlling etching time and oxidation sharpening process. The fillet radius of the fabricated grating is 50 nm, the blaze angle is 7.4°, and the surface roughness is 0.477 nm. Finally, the blazed grating is integrated in scanning micromirror to form scanning grating micromirror by MEMS fabrication technology, which can realize both optical splitting and scanning. The testing results show that the scanning grating micromirror has high diffraction efficiency in the spectral range of 810–2500 nm for the potential near-infrared spectrometer application.

Keywords

• silicon-blazed grating
• platform and fillet
• anisotropic wet etching
• oxidation sharpening
• diffraction efficiency