AIP Advances (Jun 2013)

Characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy

  • Ikai Lo,
  • Wen-Yuan Pang,
  • Wen-Yen Chen,
  • Yu-Chi Hsu,
  • Chia-Ho Hsieh,
  • Cheng-Hung Shih,
  • Mitch M. C. Chou,
  • Tzu-Min Hsu,
  • Gary Z. L. Hsu

DOI
https://doi.org/10.1063/1.4812871
Journal volume & issue
Vol. 3, no. 6
pp. 062134 – 062134

Abstract

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The characterization of GaN microstructures grown by plasma-assisted molecular beam epitaxy on LiAlO2 substrate was studied by cathodoluminescence and photoluminescence measurements. We demonstrated that the cathodoluminescence from oblique semi-polar surfaces of mushroom-shaped GaN was much brighter than that from top polar surface due to the reduction of polarization field on the oblique semi-polar surfaces. It implies that the oblique semi-polar surface is superior for the light-emitting surface of wurtzite nano-devices.