Light: Science & Applications (Apr 2022)

Spatial modulation of nanopattern dimensions by combining interference lithography and grayscale-patterned secondary exposure

  • Zhuofei Gan,
  • Hongtao Feng,
  • Liyang Chen,
  • Siyi Min,
  • Chuwei Liang,
  • Menghong Xu,
  • Zijie Jiang,
  • Zhao Sun,
  • Chuying Sun,
  • Dehu Cui,
  • Wen-Di Li

DOI
https://doi.org/10.1038/s41377-022-00774-z
Journal volume & issue
Vol. 11, no. 1
pp. 1 – 10

Abstract

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Wafer-scale fabrication of periodic nanostructures with spatially modulated feature sizes is achieved by combining interference lithography and grayscale-patterned secondary exposure, opening new pathways toward large-area nanophotonic devices.