APL Materials (Jul 2022)

Probing electronic dead layers in homoepitaxial n-SrTiO3(001) films

  • S. A. Chambers,
  • D. Lee,
  • Z. Yang,
  • Y. Huang,
  • W. Samarakoon,
  • H. Zhou,
  • P. V. Sushko,
  • T. K. Truttmann,
  • L. W. Wangoh,
  • T.-L. Lee,
  • J. Gabel,
  • B. Jalan

DOI
https://doi.org/10.1063/5.0098500
Journal volume & issue
Vol. 10, no. 7
pp. 070903 – 070903-9

Abstract

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We combine state-of-the-art oxide epitaxial growth by hybrid molecular beam epitaxy with transport, x-ray photoemission, and surface diffraction, along with classical and first-principles quantum mechanical modeling to investigate the nuances of insulating layer formation in otherwise high-mobility homoepitaxial n-SrTiO3(001) films. Our analysis points to charge immobilization at the buried n-SrTiO3/undoped SrTiO3(001) interface as well as within the surface contamination layer resulting from air exposure as the drivers of electronic dead-layer formation. As Fermi level equilibration occurs at the surface and the buried interface, charge trapping reduces the sheet carrier density (n2D) and renders the n-STO film insulating if n2D falls below the critical value for the metal-to-insulator transition.