Investigation of effective parameters on Fe/Ta thin films by plasma focus device: number of shots and distance from tip anode

Abstract

Abstract This experimental investigation is the first to generate a surface iron-tantalum (Fe/Ta) alloy as a sublayer-layer using a plasma focus device. Examining how ion beams from a plasma focus device alloy iron and tantalum with varying melting points is one of the key objectives of this study. Fe/Ta thin film nanostructure and surface morphology were also examined. The distance from the tip anode and the varied number of shots are the experimental variables. Although tantalum's melting point (3020 $$^\circ{\rm C}$$ ∘ C ) is generally known to be near to that of iron (2862 $$^\circ{\rm C}$$ ∘ C ), it is possible that iron vaporizes and partial alloying of iron with tantalum occurs before tantalum reaches its melting point. Fe/Ta thin film identification techniques include scanning electron microscopy, mapping of cross-section, energy dispersive X-ray spectroscopy, and X-ray diffraction pattern. Additionally, the composition of multilayer structures is examined using EDS. In conclusion, the results of the X-ray diffraction pattern showed that the number of shots had a significant impact on the residual strain degree of the thin films that were deposited. Furthermore, structures made of FeTa and Fe2Ta were produced. Additionally, photos from scanning electron microscopy and cross-section mapping verify that the sample with five shots at an 8 cm distance from the tip anode formed a uniform Fe/Ta alloy structure. The sample with five shots at a distance of 4 cm from the tip anode formed micro-island structures, as seen by scanning electron microscopy, with decreasing distance. Furthermore, depth elemental distribution revealed that the optimal depth of penetration in a homogenous material to develop alloying is best determined by number of PF shots.

Keywords

• Fe/Ta thin films
• Plasma focus device (PF)
• Ion beams
• Number of shots
• Distance from tip anode