Nanoscale Research Letters (Dec 2019)

Reducing Interface Traps with High Density Hydrogen Treatment to Increase Passivated Emitter Rear Contact Cell Efficiency

  • Chih-Cheng Yang,
  • Po-Hsun Chen,
  • Ting-Chang Chang,
  • Wan-Ching Su,
  • Sung-Yu Chen,
  • Shui-Chin Liu,
  • Sheng-Yao Chou,
  • Yung-Fang Tan,
  • Chun-Chu Lin,
  • Pei-Yu Wu,
  • Tsung-Ming Tsai,
  • Hui-Chun Huang

DOI
https://doi.org/10.1186/s11671-019-3216-3
Journal volume & issue
Vol. 14, no. 1
pp. 1 – 7

Abstract

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Abstract In this work, a high-density hydrogen (HDH) treatment is proposed to reduce interface traps and enhance the efficiency of the passivated emitter rear contact (PERC) device. The hydrogen gas is compressed at pressure (~ 70 atm) and relatively low temperature (~ 200 °C) to reduce interface traps without changing any other part of the device’s original fabrication process. Fourier-transform infrared spectroscopy (FTIR) confirmed the enhancement of Si–H bonding and secondary-ion mass spectrometry (SIMS) confirmed the SiN/Si interface traps after the HDH treatment. In addition, electrical measurements of conductance-voltage are measured and extracted to verify the interface trap density (Dit). Moreover, short circuit current density (Jsc), series resistance (Rs), and fill factor (F.F.) are analyzed with a simulated light source of 1 kW M−2 global AM1.5 spectrum to confirm the increase in cell efficiency. External quantum efficiency (EQE) is also measured to confirm the enhancement in conversion efficiency between different wavelengths. Finally, a model is proposed to explain the experimental result before and after the treatment.

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