IEEE Open Journal of Nanotechnology (Jan 2022)

Plasma Synthesis of Silicon Nanoparticles: From Molecules to Clusters and Nanoparticle Growth

  • Shota Nunomura,
  • Kunihiro Kamataki,
  • Takehiko Nagai,
  • Tatsuya Misawa,
  • Shinji Kawai,
  • Kosuke Takenaka,
  • Giichiro Uchida,
  • Kazunori Koga

DOI
https://doi.org/10.1109/OJNANO.2022.3209995
Journal volume & issue
Vol. 3
pp. 94 – 100

Abstract

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Plasma nanotechnology is widely used for nanoscale etching, dopant implantation and thin-film deposition for state-of-the-art semiconductor devices. Such a plasma nanotechnology has another interesting aspect of synthesizing nanoparticles, in a controlled manner of atomic composition, structure and those size. Here, we present the polymerization and growth of silicon nanoparticles from a molecular level to 10 nm-particles in hydrogen diluted silane plasmas. The polymerization and growth are experimentally studied using various plasma diagnostic tools. The results indicate that nanoparticles are rapidly formed via gas-phase reactions in a low-density plasma comprising high-energy electrons. The growth kinetics and the modification of plasma properties are discussed in terms of gas-phase reactions, charging and coagulation of nanoparticles.

Keywords