Examination of interfacial charge transfer in photocatalysis using patterned CuO thin film deposited on TiO2

K. Osako; K. Matsuzaki; H. Hosono; G. Yin; D. Atarashi; E. Sakai; T. Susaki; M. Miyauchi

doi:10.1063/1.4926934

APL Materials (Oct 2015)

Examination of interfacial charge transfer in photocatalysis using patterned CuO thin film deposited on TiO2

K. Osako,
K. Matsuzaki,
H. Hosono,
G. Yin,
D. Atarashi,
E. Sakai,
T. Susaki,
M. Miyauchi

Affiliations

K. Osako: Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan
K. Matsuzaki: Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan
H. Hosono: Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan
G. Yin: Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan
D. Atarashi: Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan
E. Sakai: Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan
T. Susaki: Secure Materials Center, Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama, Japan
M. Miyauchi: Department of Metallurgy and Ceramics Science, Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo, Japan

DOI: https://doi.org/10.1063/1.4926934
Journal volume & issue: Vol. 3, no. 10
pp. 104409 – 104409-5

Abstract

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We examined the interfacial charge transfer effect on photocatalysts using a patterned CuO thin film deposited on a rutile TiO2 (110) substrate. Photocatalytic activity was visualized based on the formation of metal Ag particles resulting from the photoreduction of Ag+ ions under visible-light illumination. Ag particles were selectively deposited near the edge of CuO film for several nanometer thick CuO film, indicating that interfacial excitation from the valence band maximum of TiO2 to the conduction band minimum of CuO plays a key role in efficient photocatalytic activity of CuO nanocluster-grafted TiO2 systems with visible-light sensitivity.

Published in APL Materials

ISSN: 2166-532X (Online)
Publisher: AIP Publishing LLC
Country of publisher: United States
LCC subjects: Technology: Chemical technology: Biotechnology; Science: Physics
Website: http://aplmaterials.aip.org

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