IEEE Journal of the Electron Devices Society (Jan 2020)

Dual-Storage-Port Nonvolatile SRAM Based on Back-End-of-the-Line Processed Hf<sub>0.5</sub>Zr<sub>0.5</sub>O&#x2082; Ferroelectric Capacitors Towards 3D Selector-Free Cross-Point Memory

  • Hao Jiang,
  • Owen Li,
  • Wenliang Chen,
  • T. P. Ma

DOI
https://doi.org/10.1109/JEDS.2020.3019024
Journal volume & issue
Vol. 8
pp. 935 – 938

Abstract

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This work presents the design and experimental demonstration of a novel dual-storage-port nonvolatile SRAM based on back-end-of-the-line processed Hf0.5Zr0.5O2-based metal-ferroelectric-metal capacitors, which offers significant advantages over the conventional single-storage-port version without area penalty, and paves the way for implementing our proposed selector-free 3D cross-point memory.

Keywords