Analysis of Current Research Status of Plasma Etch Process Model

Abstract

This paper summarizes the status of the plasma etch process modeling research. It mainly introduces typical etching models employing the analytical method, geometric method, system identification method, basic principle simulation method, as well as empirical model. Each model’s basic principles, application scopes, advantages and disadvantages are discussed. Based on these, the development history of the etch process modeling is summarized, and the development opportunities of the etch model are prospected. This paper provides a brief view for establishment of the plasma etching process model.

Keywords

• plasma etching
• etching model
• simulation