IEEE Journal of the Electron Devices Society (Jan 2014)

Sub-10-nm Asymmetric Junctionless Tunnel Field-Effect Transistors

  • Chun-Hsing Shih,
  • Nguyen Van Kien

DOI
https://doi.org/10.1109/JEDS.2014.2330501
Journal volume & issue
Vol. 2, no. 5
pp. 128 – 132

Abstract

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This study presents a new asymmetric junctionless tunnel field-effect transistor (AJ-TFET) to scale TFETs into sub-10-nm regimes. The asymmetric junctionless p+ source/body and junctional n/p+ drain/body separately optimize the lateral source and drain coupling to efficiently switch the TFETs, producing an abrupt on-off switching. Because of n-drain/p+body junction, the off-state tunnel barrier can be extended into the drain, ensuring an excellent short-channel effect without the limitation of channel lengths. Si/Ge heterojunctions and high-k gate insulators are combined with the AJ-TFETs for additional on-current boosting. Using compact structures and feasible parameters from practical Si-based CMOS technologies, the advancement in the on-off switching and short-channel effect make the AJ-TFET highly promising as an ideal approach into the sub-10-nm regimes.