IEEE Journal of the Electron Devices Society (Jan 2023)

Three Temperature Regimes in Subthreshold Characteristics of FD-SOI pMOSFETs From Room-Temperature to Cryogenic Temperatures

  • Yo-Ming Chang,
  • Ting Tsai,
  • Yu-Wen Chiu,
  • Horng-Chih Lin,
  • Pei-Wen Li

DOI
https://doi.org/10.1109/JEDS.2023.3327560
Journal volume & issue
Vol. 11
pp. 619 – 623

Abstract

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We reported three temperature regimes in subthreshold characteristics of 22-nm FD-SOI p-MOSFETs at operation ${T}\,\,=$ 300 K – 4.5 K. Subthreshold swing (SS)-plateau at 125 K – 50 K in combination with SS-linearity at ${T}\,\,=$ 300 K – 125 K and 50 K – 4.5 K were observed in different types of FD-SOI p-MOSFETs with channel length $(L_{G}) \leq100$ nm, which is possibly attributed to temperature-dependent dopant ionization induced band-to-band and trap-assisted tunneling across the drain-body junction. The phenomenon of SS linearly decreasing with temperature at ${T}$ < 50 K is not observed in neither FD-SOI n-MOSFETs nor 28 nm bulk CMOSFETs.

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