Multilayer ion trap technology for scalable quantum computing and quantum simulation

Abstract

We present a novel ion trap fabrication method enabling the realization of multilayer ion traps scalable to an in principle arbitrary number of metal-dielectric levels. We benchmark our method by fabricating a multilayer ion trap with integrated three-dimensional microwave circuitry. We demonstrate ion trapping and microwave control of the hyperfine states of a laser cooled ^9 Be ^+ ion held at a distance of 35 $\mu {\rm{m}}$ above the trap surface. This method can be used to implement large-scale ion trap arrays for scalable quantum information processing and quantum simulation.

Keywords

• surface-electrode ion trap
• atom chip
• microfabrication
• quantum logic and simulation