IEEE Journal of the Electron Devices Society (Jan 2020)

Impact of the Crystal Phase of ZrO₂ on Charge Trapping Memtransistor as Synaptic Device for Neural Network Application

  • Yu-Che Chou,
  • Chien-Wei Tsai,
  • Chin-Ya Yi,
  • Wan-Hsuan Chung,
  • Chao-Hsin Chien

DOI
https://doi.org/10.1109/JEDS.2020.2993859
Journal volume & issue
Vol. 8
pp. 572 – 576

Abstract

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In this work, we investigated the effects of the crystal phase of ZrO2 on charge trapping memtransistors (CTMTs) as synaptic devices for neural network applications. The ZrO2 deposited through thermal (t-ZrO2) atomic layer deposition (ALD) and plasma (p-ZrO2) ALD were analyzed using an X-ray diffractometer, which indicated that the t-ZrO2 consisted of pure cubic phase, whereas p-ZrO2 consisted of both cubic and tetragonal phases. Through X-ray photoelectron spectroscopy analysis, we then constructed the energy band diagram of the gate stacks. The ΔEC of tand p-ZrO2 with respect to tunneling and blocking Al2O3 were 1.84 and 1.19 eV respectively. Because of the relatively large ΔEC of t-ZrO2, the window of the flat band voltage (VFB) shift extracted from charge trapping capacitors was enlarged by 591.9 mV more than the one using p-ZrO2 as the charge trapping layer. Retention was also improved by 10.4% after 105 s in the t-ZrO2 case. Finally, we fabricated the CTMTs with the gate stack of the t-ZrO2 case and demonstrated their characteristics as synaptic devices. With the optimization of pulse schemes, we reduced the nonlinear factors of depression (αd) and potentiation (αp) from -6.72 and 6.47 to 0.03 and 0.01 respectively, enlarged the ON/OFF ratio from 15.6 to 70.4 and increased the recognition accuracy from 27.6% to 86.5% simultaneously.

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