IEEE Journal of the Electron Devices Society (Jan 2024)

Impact of Work-Function Variation in Ferroelectric Field-Effect Transistor

  • Su Yeon Jung,
  • Hyunwoo Kim,
  • Jongmin Lee,
  • Jang Hyun Kim

DOI
https://doi.org/10.1109/JEDS.2024.3465594
Journal volume & issue
Vol. 12
pp. 779 – 784

Abstract

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We analyzed the impact of work-function variation (WFV) in ferroelectric field-effect transistor (FeFET). To analyze the operation characteristics, we employed the technology computer-aided design (TCAD) simulations. After evaluating ferroelectricity (FE) characteristics and optimizing device model parameters through calibration, we extracted five key parameters from the hysteretic transfer curves of the FeFET: threshold voltage (Vth), on current (Iin), subthreshold swing (SS), off current (Ioff), and gate-induced drain leakage (GIDL). The extracted parameters were compared based on the presence or absence of FE and the ferroelectric thickness. It was confirmed that the presence of FE leads to increased variation due to dipole alignment with WFV, and that the electric field is maintained even with an increase in ferroelectric thickness

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