IEEE Journal of the Electron Devices Society (Jan 2015)

Ferroelectricity of HfZrO<sub>2</sub> in Energy Landscape With Surface Potential Gain for Low-Power Steep-Slope Transistors

  • Min Hung Lee,
  • Y.-T. Wei,
  • C. Liu,
  • J.-J. Huang,
  • Ming Tang,
  • Yu-Lun Chueh,
  • K.-Y. Chu,
  • Miin-Jang Chen,
  • Heng-Yuan Lee,
  • Yu-Sheng Chen,
  • Li-Heng Lee,
  • Ming-Jinn Tsai

DOI
https://doi.org/10.1109/JEDS.2015.2435492
Journal volume & issue
Vol. 3, no. 4
pp. 377 – 381

Abstract

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The corresponding energy landscape and surface potential are deduced from the experimental ferroelectricity of HfZrO2 (HZO) for low-power steep-slope transistor applications. The anti-ferroelectric (AFE) in annealed 600°C HZO extracted electrostatic potential gain from the measured polarization hysteresis loop and calculated subthreshold swing 33 mV/dec over six decades of IDS. A feasible concept of coupling the AFE HZO is experimentally established with the validity of negative capacitance and beneficial for steep-slope FET development in future generation.

Keywords