IEEE Journal of the Electron Devices Society (Jan 2020)

Self-Heating in FDSOI UTBB MOSFETs at Cryogenic Temperatures and its Effect on Analog Figures of Merit

  • Lucas Nyssens,
  • Arka Halder,
  • Babak Kazemi Esfeh,
  • Nicolas Planes,
  • Michel Haond,
  • Denis Flandre,
  • Jean-Pierre Raskin,
  • Valeriya Kilchytska

DOI
https://doi.org/10.1109/JEDS.2020.2999632
Journal volume & issue
Vol. 8
pp. 789 – 796

Abstract

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This work studies the self-heating (SH) effect in ultra-thin body ultra-thin buried oxide (UTBB) FDSOI MOSFETs at cryogenic temperatures down to 77 K. S-parameter measurements in a wide frequency range, with the so-called RF technique, are employed to assess SH parameters and related variation of analog figures of merit (FoMs) at different temperatures. Contrary to the expectations, the effect of self-heating on analog FoMs is slightly weaker at cryogenic temperatures with respect to room-temperature case. The extracted thermal resistance and channel temperature rise at 300 K and 77 K in short-channel devices are of the same order of magnitude. The observed increase in SH characteristic frequency with temperature reduction emphasizes the advantage of the RF technique for the fair analysis of SH-related features in advanced technologies at cryogenic temperatures.

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