Ferroelectric-Metal Field-Effect Transistor With Recessed Channel for 1T-DRAM Application

Abstract

The ferroelectric-metal field-effect transistor with recessed channel (RC-FeMFET) is proposed for one transistor dynamic random-access memory (1T-DRAM). Through technology computer-aided design (TCAD) simulations, the effects of inter-metal insertion on the FeFET with recessed channel (RC-FeFET) is identified. By evaluating electric field (e-field) across interlayer (IL) and memory window (MW), the improvements of program/erase cycling endurance and read current sensing margin (RSM) are verified in the RC-FeMFET. Moreover, considering program voltage (VW) and polarization switching time ( $\tau _{\mathrm{ p}}$ ), the guide line of the RC-FeMFET design is provided in terms of e-field across IL and MW for 1T-DRAM applications.

Keywords

• Ferroelectric-gate field-effect transistor (FeFET)
• Ferroelectric devices
• one transistor dynamic random-access memory (1T-DRAM)
• endurance characteristics of FeFET
• recess channel