IEEE Journal of the Electron Devices Society (Jan 2019)

Investigation of <inline-formula> <tex-math notation="LaTeX">$I-V$ </tex-math></inline-formula> Linearity in TaO<sub>x</sub>-Based RRAM Devices for Neuromorphic Applications

  • Changhyuck Sung,
  • Andrea Padovani,
  • Bastien Beltrando,
  • Donguk Lee,
  • Myunghoon Kwak,
  • Seokjae Lim,
  • Luca Larcher,
  • Vincenzo Della Marca,
  • Hyunsang Hwang

DOI
https://doi.org/10.1109/JEDS.2019.2902653
Journal volume & issue
Vol. 7
pp. 404 – 408

Abstract

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We perform experiments and device simulations to investigate the origin of current-voltage (I-V) linearity of TaOX-based resistive switching memory (RRAM) devices for their possible application as electronic synapses. By using electrical characterization and simulations, we link the electrical characteristics (linear or nonlinear I-V) to the microscopic properties of the conductive filament (CF). Our findings indicate that the shape and the thermal properties of the CF region are crucial to achieve linear I-V characteristics. These results allow optimizing the I-V curve linearity of TaOX-based RRAM devices, explaining the wide range of linear I-V characteristics experimentally observed on RRAM device obtained. When weight sum operation using SPICE simulations is performed, the read current is improved under the condition of linear I-V characteristics due to current loss minimization.

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