Characterization of RF Noise in UTBB FD-SOI MOSFET

Abstract

In this paper, we report the noise measurements in the RF frequency range for ultrathin body and thin buried oxide fully depleted silicon on insulator (FD-SOI) transistors. We analyze the impact of back and front gate biases on the various noise parameters; along with discussions on the secondary effects in FD-SOI transistors which contribute to the thermal noise. Using calibrated TCAD simulations, we show that the noise figure changes with the substrate doping and buried oxide thickness.

Keywords

• Thermal noise
• high frequency noise
• device modeling
• RF
• FDSOI
• MOSFET