IEEE Journal of the Electron Devices Society (Jan 2018)

Importance of $\Delta V_{{\text {DIBLSS}}}/({I}_{{\text {on}}} /{I}_{{\text {off}}})$ in Evaluating the Performance of n-Channel Bulk FinFET Devices

  • Yi-Chuen Eng,
  • Luke Hu,
  • Tzu-Feng Chang,
  • Steven Hsu,
  • Chun Mao Chiou,
  • Ted Wang,
  • Chih-Wei Yang,
  • Osbert Cheng,
  • Chih-Yi Wang,
  • C. S. Tseng,
  • Ren Huang,
  • Po-Hsieh Lin,
  • Kuan-Yu Lu,
  • I-Fan Chang,
  • Chi-Ju Lee,
  • Yen-Liang Wu,
  • Mike Chang

DOI
https://doi.org/10.1109/JEDS.2018.2789922
Journal volume & issue
Vol. 6
pp. 207 – 213

Abstract

Read online

This paper aims to investigate the recently proposed figure of merit, ΔVDIBLSS/(Ion/Ioff), in detail. Experimental results show that ΔVDIBLSS/(Ion/Ioff) represents the index of device immunity to short-channel effects in bulk FinFETs. The value of its numerator, ΔVDIBLSS, accounts for the drain-induced barrier lowering and subthreshold swing. The value of its denominator, Ion/Ioff, accounts for the transistor performance in transitioning between on and off states. Small ΔVDIBLSS and large Ion/Ioff are desirable, representing the improved gate control over the channel potential. We found that both ΔVDIBL and ΔVSS values are more correlated with the drain off-state current, Ioff, than they are with the drain on-state current, Ion. A high-performance FinFET device exhibits ΔVDIBLSS of about 100 mV and Ion/Ioff of about 1 × 106. Thus, ΔVDIBLSS/(Ion/Ioff) in a high-performance FinFET device is expected to be around 1×10-4 mV. Using this figure of merit, along with the verification using conventional parameters such as ΔVDIBLSS and Ion/Ioff, the proposed device shows better electrical characteristics than that in our previous work due to the optimized process conditions implemented.

Keywords